ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology. pp.429-440, 1997. Pennington, NJ. Electrochemical Society
Osburn, C.M. ; Chevacharoenkul, S. ; Wang, Q.F. ; Tsai, J.Y. ; Cowen, A. ; Rose, J. ; Zhang, X. ; Kellam, M.
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Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993. pp.146-157, 1993. Pennington, NJ. Electrochemical Society
Srivastava, A. ; Sun, J. ; Bellur, K. ; Bartholomew, R. ; O'Neil, P. ; Celik, M. ; Osburn, C.M. ; Masnari, N.A. ; OEztuerk, M.C. ; Westhoff, R. ; Fowler, B.
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ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology. pp.571-586, 1997. Pennington, NJ. Electrochemical Society
Sun, J. ; Srivastava, A. ; Bartholomew, R.F. ; Bellur, K. ; Osburn, C.M. ; Masnari, N.A.
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ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology. pp.587-600, 1997. Pennington, NJ. Electrochemical Society
Osburn, C.M. ; Tsai, J.Y. ; Wang, Q.F. ; Rose, J. ; Cowen, A.
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Proceedings of the Third International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.576-591, 1993. Pennington, NJ. Electrochemical Society
Kim, I. ; Han, S.K. ; Kiether, W. ; Lee, S.J. ; Lee, C.H. ; Luan, H.F. ; Luo, Z. ; Rying, E. ; Wicaksana, Z.Wang D. ; Zhu, W. ; Hauser, J. ; Kiingon, A. ; Kwang, D.L. ; Ma, T.P. ; Maria, J.P. ; Misra, V. ; Osburn, C.M.
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Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.211-220, 2001. Pennington, NJ. Electrochemical Society
Layered structures : heteroepitaxy, superlattices, strain, and metastability : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A.. pp.299-306, 1990. Pittsburgh, Pa.. Materials Research Society
Evolution of thin-film and surface microstructure : symposium held November 26-December 1, 1990, Boston, Massachusetts, U.S.A.. pp.101-106, 1991. Pittsburgh, Pa.. Materials Research Society
Osburn, C.M. ; Han, S.K. ; Kim, I. ; Campbell, S.A. ; Garfunkel, E. ; Gustafson, T. ; Hauser, J. ; King, T.-J. ; Liu, Q. ; Ranade, P. ; Kingon, A. ; Kwong, D.-L. ; Lee, S.J. ; Lee, C.H. ; Lee, J. ; Onishi, K. ; Kang, C.S. ; Choi, R. ; Cho, H. ; Nich, R. ; Lucovsky, G. ; Hong, J.G. ; Ma, T.P. ; Zhu, W. ; Luo, Z. ; Maria, J.P. ; Wicaksana, D. ; Misra, V. ; Lee, J.J. ; Suh, Y.S. ; Parksons, G. ; Niu, D. ; Stemmer, S.
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ULSI Process Integration : proceedings of the International Symposium. pp.375-390, 2003. Pennington, N.J.. Electrochemical Society
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.145-152, 2002. Pennington, NJ. Electrochemical Society
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.677-686, 1996. Pennington, NJ. Electrochemical Society
Zhang, K.X. ; Osburn, C.M. ; Hames, G. ; Parker, C. ; Bayoumi, A.
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ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology. pp.68-79, 1995. Pennington, NJ. Electrochemical Society