1.

Conference Proceedings
Conference Proceedings
1. Illumination condition and mask bias for 0.15-ｦﾌm pattern with KrF and ArF lithography
Tabuchi,H. ; Shichijo,Y. ; Oka,N. ; Takenaka,N. ; lguchi,K.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.860-871,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Development of simplified process for KrF excimer halftone mask with chrome-shielding method
Kobayashi,S. ; Oka,N. ; Watanabe,K. ; Ohmori,K. ; Inoue,M. ; Iguchi,K.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.288-296,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873