1.

Conference Proceedings
Conference Proceedings
1. Experimental characterization of constituent errors in electron-beam lithography [6283-17]
Cinque, R. ; Buck, P. ; Yei, S. K. ; Komagata, T. ; Nakagawa, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Development of an e-beam lithography system for 100- to 90-nm node reticles
Komagata, T. ; Kawase, Y. ; Nakagawa, Y. ; Gotoh, N. ; Tanaka, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.328-338,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. High-alignment-accuracy EB writing of phase shift image for 65-nm node masks
Kimura, N. ; Komagata, T. ; Nakagawa, Y. ; Gotoh, N. ; Tanaka, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.675-680,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of overlay accuracy of phase-shift image for 65-nm node masks
Komagata, T. ; Kimura, N. ; Funaki, K. ; Nakagawa, Y. ; Gotoh, N.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1315-1322,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567