Kimura, N. ; Komagata, T. ; Nakagawa, Y. ; Gotoh, N. ; Tanaka, K.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.675-680, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering