1.

Conference Proceedings
Conference Proceedings
1. Mask pafferning using chemically amplified resists and the novel STEAG HamaTech blank coater ASR5000
Koepernik, C. ; Beyer, D. ; Dress, P. ; Hoffmann, T. ; Hudek, P. ; Irmscher, M. ; Krauss, C. ; Leibold, B. ; Mueller, D. ; Reuter, C. ; Springer, R. ; Szekeresch, J. ; Voehringer, P.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.725-736,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Comparative evaluation of e-beam sensitive chemically amplifild resists for mask making
Irmscher, M. ; Beyer, D. ; Butschke, J. ; Constantine, C. ; Hoffmann, T. ; Koepernik, C. ; Krauss, C. ; Leibold, B. ; Letzkus, F. ; Mueller, D. ; Springer, R. ; Voehringer, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.176-187,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Back to square 9: a demonstration of 9-in. reticle capability
Cummings, K.D. ; Schneider-Stoermann, L.U. ; Buttgereit, U. ; Irmscher, M. ; Mueller, D. ; Hudek, P. ; Beyer, D. ; Brendel, B. ; Whittey, J.M. ; Eynon, B.G. ; Harsch, J. ; Constantine, C. ; Miller, K.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.15-24,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889