Femtosecond laser ablation of Cr-SiO2 binary mask
- Author(s):
- Okamoto, T. ( Osaka Univ. (Japan) )
- Morishige, Y. ( NEC Corp. (Japan) )
- Ohmura, E. ( Osaka Univ. (Japan) )
- Sano, T.
- Miyamoto, I.
- Publication title:
- Third International Symposium on Laser Precision Microfabrication : proceedings : 27-31 May, 2002, Osaka, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4830
- Pub. Year:
- 2003
- Page(from):
- 510
- Page(to):
- 514
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446015 [0819446017]
- Language:
- English
- Call no.:
- P63600/4830
- Type:
- Conference Proceedings
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