1.

Conference Proceedings
Conference Proceedings
1. First microprocessors with immersion lithography
Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.119-128,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Ni Salicide Technology for Deep Sub-Quarter Micron Transistor
Choi, C.-J. ; Ku, J.-H. ; Choi, S. ; Fujihara, K. ; Kang, H.-K. ; Moon, J.-T. ; Choi, H.-J. ; Ko, D.-H.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.565-570,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-2
3.

Conference Proceedings
Conference Proceedings
3. 69 Highly Scalable PVD/CVD-Cobalt Bilayer Salicidation Technology for sub-50nm CMOSFETs
Yun, J.-H. ; Kim, H.-S. ; Jung, S.-W. ; Jung, E. J. ; Kim, B.-H. ; Choi, G. H. ; Kim, S. T. ; Chung, U-In. ; Moon, J.-T.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.577-584,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. Water distribution within immersed polymer films
Kang, Y. ; Hong, J. ; Lee, S.-Y. ; Lee, H.-R. ; Ryoo, M.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.31-39,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. Requirement of in-field illumination control for low k1 imaging below 0.3
Hwang, C. ; Shin, J. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1548-1556,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
6.

Conference Proceedings
Conference Proceedings
6. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
7.

Conference Proceedings
Conference Proceedings
7. Implementation of the ArF resists based on VEMA for sub-100-nm device
Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.533-540,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
8.

Conference Proceedings
Conference Proceedings
8. Efffectiveness and confirmation of local area flare measurement method in various pattern layouts
Nam, D. ; Lee, E. ; Jung, S.-G. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.57-66,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
9.

Conference Proceedings
Conference Proceedings
9. ArF issues of 90-nm-node DRAM device integration
Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1296-1303,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
10.

Conference Proceedings
Conference Proceedings
10. Challenge for effective OCV control in 90-nm logic gate using ArF lithography
Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1194-1201,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
11.

Conference Proceedings
Conference Proceedings
11. Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
Kim, I.-S. ; Jung, S.-G. ; Kim, H.-D. ; Yeo, G.-S. ; Shin, I.-K. ; Lee, J.-H. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.466-475,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
12.

Conference Proceedings
Conference Proceedings
12. Way for LEEPL technology to succeed in memory device application
Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.1060-1067,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
13.

Conference Proceedings
Conference Proceedings
13. Successful application of angular scatterometry to process control in sub-100-nm DRAM device
Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.541-549,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
14.

Conference Proceedings
Conference Proceedings
14. Realization of sub-80-nm small-space patterning in ArF photolithography
Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1082-1090,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
15.

Conference Proceedings
Conference Proceedings
15. A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
Lee, S. ; Hwang, C. ; Park, D.-W. ; Kim, I.-S. ; Kim, H.-C. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.1413-1421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
16.

Conference Proceedings
Conference Proceedings
16. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
Lee, J.-Y. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.426-433,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
17.

Conference Proceedings
Conference Proceedings
17. Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]
Chalykh, R. ; Pundaleva, I. ; Kim, S. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Photomask Technology 2006.  pp.63491K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
18.

Conference Proceedings
Conference Proceedings
18. Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography
Kim, S.-H. ; Lee, S.-H. ; Yeo, G.-S. ; Lee, J.H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.940-947,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
19.

Conference Proceedings
Conference Proceedings
19. What an antishrinkage coating method can surmount among stumbling block of ArF resists
Kim, H.-D. ; Lee, S.-H. ; Choi, S.-J. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.827-837,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039