Reactive polymers: a route to nanoimprint lithography at low temperatures
- Author(s):
Pfeiffer, K. ( micro resist technology GmbH (Germany) ) Reuther, F. ( micro resist technology GmbH (Germany) ) Carlberg, P. ( Lund Univ. (Sweden) ) Fink, M. ( micro resist technology GmbH (Germany) ) Gruetzner, G. ( micro resist technology GmbH (Germany) ) Montelius, L. ( Lund Univ. (Sweden) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 6
- Page(from):
- 203
- Page(to):
- 210
- Pages:
- 8
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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