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Reactive polymers: a route to nanoimprint lithography at low temperatures

Author(s):
Pfeiffer, K. ( micro resist technology GmbH (Germany) )
Reuther, F. ( micro resist technology GmbH (Germany) )
Carlberg, P. ( Lund Univ. (Sweden) )
Fink, M. ( micro resist technology GmbH (Germany) )
Gruetzner, G. ( micro resist technology GmbH (Germany) )
Montelius, L. ( Lund Univ. (Sweden) )
1 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
1
Pt.:
Session 6
Page(from):
203
Page(to):
210
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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