1.

Conference Proceedings
Conference Proceedings
1. THICKNESS DEPENDENCE OF ELECTRICAL TRANSPORT IN BURIED CoSi2 FILMS FABRICATED BY ION BEAM SYNTHESIS
Radermacher, K. ; Jebasinski, R. ; Mantl, S. ; Monroe, D. ; White, A. E. ; Short, K. T.
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.209-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320
2.

Conference Proceedings
Conference Proceedings
2. ELECTRICAL AND OPTICAL PROPERTIES OF FeSi2 LAYERS
Radermacher, K. ; Skeide, O. ; Carius, R. ; Klomfass, J. ; Mantl, S.
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.115-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320
3.

Conference Proceedings
Conference Proceedings
3. GROWTH OF ION IMPLANTED BURIED FeSi2 ON Si(111) AND Si(100)
Radermacher, K. ; Mantl, S. ; Dieker, Ch. ; Holzbrecher, H. ; Speier, W. ; Luth, H.
Pub. info.: Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.273-278,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 235
4.

Conference Proceedings
Conference Proceedings
4. CoSi2 PRECIPITATE COARSENING DURING FORMATION OF BURIED EPITAXIAL CoSi2 LAYERS BY ION BEAM SYNTHESIS
Jebasinski, R. ; Mantl, S. ; Radermacher, K. ; Fichtner, P. ; Jager, W. ; Buchal, Ch.
Pub. info.: Surface chemistry and beam-solid interactions : symposium held November 26-29, 1990, Boston, Massachusetts, U.S.A..  pp.411-416,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 201
5.

Conference Proceedings
Conference Proceedings
5. Silicon Surface Chemistry by IR Spectroscopy in the Mid- to Far-IR Region: H2O and Ethanol on Si(100)
Struck, L. M. ; Eng, J., Jr. ; Bent, B. E. ; Chabal, Y. J. ; Williams, G. P. ; White, A. E. ; Christman, S. ; Chaban, E. E. ; Raghavachari, K. ; Flynn, G. W. ; Radermacher, K. ; Mantl, S.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.395-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386