1.

Conference Proceedings
Conference Proceedings
1. Atomic Layer Deposition of HfO2 on (100) and (110) Oriented Silicon Surfaces
L. Nyns ; L. Ragnarsson ; L. Hall ; A. Delabie ; M. Heyns
Pub. info.: Physics and technology of high-k gate dielectrics 5.  pp.73-77,  2007.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(4)
2.

Conference Proceedings
Conference Proceedings
2. Growth Studies and Reaction Mechanism of the Atomic Layer Deposition of Hafnium Oxide
A. Debbie ; M. Caymax ; S. Brijs ; D. Brunco ; T. Conard ; E. Sleeckx ; L. Ragnarsson ; S. Van Elshocht ; S. De Gendt ; M. Heyns
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.433-446,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)