1.

Conference Proceedings
Conference Proceedings
1. Model-based OPC for first-generation 193-nm lithography
Lucas,K.D. ; Word,J.C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Jonckheere,R.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings
Conference Proceedings
2. ArF lithography options for 100-nm technologies
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346