1.

Conference Proceedings
Conference Proceedings
1. Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning
Sturtevant,J.L. ; Allgair,J. ; Fu,C.-C. ; Green,K.G. ; Hershey,R.R. ; Kling,M.E. ; Litt,L.C. ; Lucas,K.D. ; Roman,B.J. ; Seligman,C.S. ; Schippers,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.220-227,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
Kling,M.E. ; Cave,N. ; Falch,B.J. ; Fu,C.-C. ; Green,K.G. ; Lucas,K.D. ; Roman,B.J. ; Reich,A.J. ; Sturtevant,J.L. ; Tian,R. ; Russell,D.R. ; Karklin,L. ; Wang,Y.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.10-17,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679