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Conference Proceedings

1. Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances

Liu,H.-Y. ; Karklin,L. ; Wang,Y.-T. ; Pati,Y.C.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.2-14, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Application of alternating phase-shifting masks to 140-nm gate patterning: Iinewidth control improvements and design optimization

Liu,H.-Y. ; Karklin,L. ; Wang,Y.-T. ; Pati,Y.C.

Pub. info.:	17th Annual BACUS Symposium on Photomask Technology and Management. pp.328-337, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3236

Conference Proceedings

3. Lithography process calibration with applications in defect printability analysis

Wu,S.-P. ; Liu,H.-Y. ; Chang,F.-C. ; Karklin,L.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.485-491, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546