Image-blur tolerances for 65-nm and 45-nm node IC manufacturing
- Author(s):
- Lalovic, I. ( Advanced Micro Devices, Inc. (USA) )
- Kroyan, A. ( Numerical Technologies, Inc. (USA) )
- Kye, J. ( Advanced Micro Devices, Inc. (USA) )
- Liu, H.-Y. ( Numerical Technologies, Inc. (USA) )
- Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
- Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Three
- Page(from):
- 1570
- Page(to):
- 1580
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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