Implementing AAPSM in 90-nm product with practical image imbalance correction
- Author(s):
Lin, B.S. ( United Microelectronics Corp. (Taiwan) ) Hsu, S.- ( United Microelectronics Corp. (Taiwan) ) Huang, I.H. ( United Microelectronics Corp. (Taiwan) ) Chen, K. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsu, T. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Liu, H.-Y. ( Synopsys, Inc. (USA) ) Kroyan, A. ( Synopsys, Inc. (USA) ) Hsu, F. ( Synopsys, Inc. (USA) ) Huang, J. ( Synopsys, Inc. (USA) ) - Publication title:
- 23rd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5256
- Pub. Year:
- 2003
- Page(from):
- 103
- Page(to):
- 111
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451439 [0819451436]
- Language:
- English
- Call no.:
- P63600/5256.1
- Type:
- Conference Proceedings
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