1.

Conference Proceedings
Conference Proceedings
1. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
3.

Conference Proceedings
Conference Proceedings
3. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. CPL mask technology for sub-100-nm contact hole imaging
Kasprowicz, B.S. ; Conley, W.E. ; Litt, L.C. ; Van Den Broeke, D.J. ; Montgomery, P.K. ; Socha, R.J. ; Wu, W. ; Lucas, K.D. ; Roman, B.J. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Progler, C.J. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.624-631,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Flare and its impact on low-k1 KrF and ArF lithography
La Fontaine, B. ; Dusa, M.V. ; Acheta, A. ; Chen, C. ; Bourov, A. ; Levinson, H.J. ; Litt, L.C. ; Mulder, M. ; Seltman, R. ; van Praagh, J.
Pub. info.: Optical Microlithography XV.  Part One  pp.44-56,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Mighty high-T lithography for 65-nm generation contacts
Conley, W. ; Montgomery, P.K. ; Lucas, K. ; Litt, L.C. ; Maltabes, J.G. ; Dieu, L. ; Hughes, G.P. ; Mellenthin, D.L. ; Socha, R.J. ; Fanucchi, E.L. ; Verhappen, A. ; Wampler, K.E. ; Yu, L. ; Schaefer, E. ; Cassel, S. ; Kuijten, J.P. ; Pijnenburg, W. ; Wiaux, V. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1210-1219,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Optical Microlithography XV.  Part One  pp.515-529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node
Dieu, L. ; Fanucchi, E.L. ; Hughes, G.P. ; Maltabes, J.G. ; Mellenthin, D.L. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Socha, R.J. ; Wampler, K.E. ; Verhappen, A. ; Kiuten, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1227-1233,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Application of chromeless phase lithography (CPL) masks in ArF lithography
Kasprowicz, B.S. ; Progler, C.J. ; Wu, W. ; Conley, W. ; Litt, L.C. ; Van Den Broeke, D.J. ; Wampler, K.E. ; Socha, R.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1189-1201,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.408-419,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
11.

Conference Proceedings
Conference Proceedings
11. ArF solutions for low-k1 back-end imaging
Wiaux, V. ; Montgomery, P.K. ; Vandenberghe, G. ; Monnoyer, P. ; Ronse, K.G. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Finders, J. ; Socha, R. ; Broeke, D.J.V.D.
Pub. info.: Optical Microlithography XVI.  Part One  pp.270-281,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
12.

Conference Proceedings
Conference Proceedings
12. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
13.

Conference Proceedings
Conference Proceedings
13. Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
Patterson, K. ; Litt, L.C. ; Maltabes, J.G. ; Hughes, G.P. ; Robertson, T. ; Montgomery, B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1033-1040,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
14.

Conference Proceedings
Conference Proceedings
14. Evaluation and characterization of flare in ArF lithography
Litt, L.C. ; Bourov, A. ; La Fontaine, B. ; Apelgren, E.M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1442-1452,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
15.

Conference Proceedings
Conference Proceedings
15. Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
Montgomery, P.K. ; Lucas, K.D. ; Litt, L.C. ; Conley, W. ; Fanucchi, E. ; Van Wingerden, J. ; Vandenberghe, G. ; Wiaux, V. ; Taylor, D. ; Cangemi, M.J. ; Kasprowicz, B.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.814-825,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
16.

Conference Proceedings
Conference Proceedings
16. RET integration of CPL technology for random logic
Hsu, S.D. ; Van Den Broeke, D.J. ; Chen, J.F. ; Shi, X. ; Hsu, M. ; Laidig, T.L. ; Conley, W. ; Litt, L.C. ; Wu, W.
Pub. info.: Optical Microlithography XVII.  pp.510-526,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
17.

Conference Proceedings
Conference Proceedings
17. Defect printability in CPL mask technology
Kuijten, J.-P. ; Verhappen, A. ; Pijnenburg, W. ; Conley, W. ; Litt, L.C. ; Wu, W. ; Montgomery, P. ; Roman, B.J. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Van Den Broeke, D.J. ; Schaefer, E. ; Cook, P.
Pub. info.: Optical Microlithography XVII.  pp.1032-1039,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
18.

Conference Proceedings
Conference Proceedings
18. The application of CPL reticle technology for the 0.045-mm node
Conley, W. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P.
Pub. info.: Optical Microlithography XVII.  pp.504-509,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
19.

Conference Proceedings
Conference Proceedings
19. The impact of MEEF through pitch for 120-nm contact holes
Litt, L.C. ; Wu, W. ; Conley, W. ; Lucas, K.D. ; Roman, B.J. ; Montgomery, P. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Verhappen, A. ; Wampler, K.E. ; Schaefer, E. ; Cook, P. ; Kuijten, J.-P. ; Pijnenburg, W.
Pub. info.: Optical Microlithography XVII.  pp.1305-1314,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
20.

Conference Proceedings
Conference Proceedings
20. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691