1.

Conference Proceedings
Conference Proceedings
1. 0.13-ｦﾌm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
Chen,Y.T. ; Lin,C.H. ; Lin,H.T. ; Hsieh,H.C. ; Yu,S.S. ; Yen,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.99-110,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Combination of OPC and AttPSM for patterning sub-0.18-ｦﾌm logic devices
Kuo,H.J. ; Lin,C.H. ; Tzu,S.D. ; Yen,A.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.435-445,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679