Resolution enhancement in optical lithography using polarized film mask
- Author(s):
- Yu, G. ( Institute of Optics and Electronics, CAS (China) )
- Lin, W. ( Institute of Optics and Electronics, CAS (China) )
- Chen, X. ( Institute of Optics and Electronics, CAS (China) )
- Xing, T. ( Institute of Optics and Electronics, CAS (China) )
- Yao, H. ( Institute of Optics and Electronics, CAS (China) )
- Publication title:
- Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5774
- Pub. Year:
- 2004
- Page(from):
- 567
- Page(to):
- 570
- Pages:
- 4
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457554 [0819457558]
- Language:
- English
- Call no.:
- P63600/5774
- Type:
- Conference Proceedings
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