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Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system

Author(s):
Lin, W. ( United Microelectronics Corp. (Taiwan) )
Liao, S. ( United Microelectronics Corp. (Taiwan) )
Tsai, R. ( United Microelectronics Corp. (Taiwan) )
Yeh, M. ( United Microelectronics Corp. (Taiwan) )
Hsieh, C. ( United Microelectronics Corp. (Taiwan) )
Yu, Y. ( United Microelectronics Corp. (Taiwan) )
Lin, B. S. ( United Microelectronics Corp. (Taiwan) )
Fu, S. ( KLA-Tencor Corp. (Taiwan) )
Dziura, T. G. ( KLA-Tencor Corp. (USA) )
4 more
Publication title:
Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5755
Pub. Year:
2005
Page(from):
138
Page(to):
144
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457356 [0819457353]
Language:
English
Call no.:
P63600/5755
Type:
Conference Proceedings

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