Ronse, K. ; Vandenberghe, G. ; Hendrickx, E. ; Leunissen, L. H. A. ; Aksenov, Y.
Pub. info.:
EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.6-12, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Geh, B. ; Flagello, D. G. ; Pregler, C. ; Martin, P. M. ; Leunissen, L. H. A. ; Hansen, S. ; de Boeij, W.
Pub. info.:
25th Annual BACUS Symposium on Photomask Technology. pp.599210-599210, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lorusso, G. F. ; Leunissen, L. H. A. ; Gustin, C. ; Mercha, A. ; Jurczak, M. ; Marchman, H. M. ; Azordegan, A.
Pub. info.:
Metrology, Inspection, and Process Control for Microlithography XX. pp.61520W-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.243-251, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering