1.

Conference Proceedings
Conference Proceedings
1. Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.
Pub. info.: Optical Microlithography XIX.  pp.61541E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of embedded binary masks [6349-21]
Cangemi, M. ; Philipsen, V. ; Leunissen, L. H. A. ; Taylor, D.
Pub. info.: Photomask Technology 2006.  pp.63490L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, L. H. A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.243-251,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853