1.

Conference Proceedings
Conference Proceedings
1. Mask substrate birefringence requirements for hyper-NA lithography [6154-159]
van de Kerkhof, M. ; de Boeij, W. ; Demarteau, M. ; Geh, B. ; Leunissen, L. H. A. ; Martin, P. ; Cangemi, M.
Pub. info.: Optical Microlithography XIX.  pp.615444-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of embedded binary masks [6349-21]
Cangemi, M. ; Philipsen, V. ; Leunissen, L. H. A. ; Taylor, D.
Pub. info.: Photomask Technology 2006.  pp.63490L-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349