Nitrogen implantation: reverse short channel effects improvement and its drawbacks

Nitrogen implantation: reverse short channel effects improvement and its drawbacks

Author(s):

Lee,T.K. ( Nanyang Technology Univ.(Singapore) )
Nga,Y.A. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Liu,P.C. ( Nanyang Technology Univ.(Singapore) )
Gan,C.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Zhang,Y.Q. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Publication title:

Microelectronic Device Technology : 1-2 October 1997, Austin, Texas

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3212

Pub. Year:

1997

Page(from):

304

Page(to):

311

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426444 [081942644X]

Language:

English

Call no.:

P63600/3212

Type:

Conference Proceedings

Details

TDL ID:	ZA00018328
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Microelectronic Device Technology
Conf. info. (Number):	1997
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1997.10.01-1997.10.02

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