Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.304-310, 2003. Pennington, N.J.. Electrochemical Society
Materials reliability in microelectronics IX : symposium held April 6-8, 1999, San Francisco, California, U.S.A.. pp.237-, 1999. Pittsburgh, Pa.. MRS - Materials Research Society
Jeong, H-D. ; Kim, H-G. ; Lee, S-H. ; Moon, D-K. ; Park, J-G.
Pub. info.:
Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.173-180, 2000. Warrendale, PA. Materials Research Society