Development of multi-function hard mask to simplify process step [6153-108]
- Author(s):
Lee, K. ( Hynix Semiconductor Inc. (South Korea) ) Kim, S. ( Hynix Semiconductor Inc. (South Korea) ) Lee, G. ( Hynix Semiconductor Inc. (South Korea) ) Lee, S. ( Hynix Semiconductor Inc. (South Korea) ) Cho J ( Hynix Semiconductor Inc. (South Korea) ) Kim W ( Hynix Semiconductor Inc. (South Korea) ) Bok C ( Hynix Semiconductor Inc. (South Korea) ) Kim H ( Hynix Semiconductor Inc. (South Korea) ) Moon S ( Hynix Semiconductor Inc. (South Korea) ) Kim J ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61532V
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Optimization of material and process parameter for minimizing defect in implementation of MFHM process
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Simulation and experiments for inspection properties of EUV mask defects [6283-85]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
OPC to account for thick mask effect using simplified boundary layer model [6349-133]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Overlay metrology for dark hard mask process: simulation and experiment study
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Polymer structure modifications for immersion leaching and watermark control [6153-77]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |