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12 results

Conference Proceedings

1. Evaluation of ArF CLM in the sub-100-nm DRAM cell

Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.251-260, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

2. Efffectiveness and confirmation of local area flare measurement method in various pattern layouts

Nam, D. ; Lee, E. ; Jung, S.-G. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XV. Part One pp.57-66, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

3. ArF issues of 90-nm-node DRAM device integration

Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1296-1303, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1194-1201, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.727-735, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Kim, I.-S. ; Jung, S.-G. ; Kim, H.-D. ; Yeo, G.-S. ; Shin, I.-K. ; Lee, J.-H. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XV. Part One pp.466-475, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

7. Comprehensive approach to determining the specification for mask mean to target

Lee, S.-W. ; Kim, I.S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.209-220, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. Assessments on process parameters' influences to the proximity correction

Lee, E.-M. ; Lee, S.-W. ; Lee, D.-Y. ; Choi, S.-H. ; Park, J.-O. ; Jung, S.-G. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.287-295, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

Conference Proceedings

9. Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.1082-1090, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

10.

Conference Proceedings

10. Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, S.-W. ; Lee, S.-W. ; Park, C.-M. ; Choi, S.-H. ; Lee, Y.-M. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.1157-1164, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

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