1.

Conference Proceedings
Conference Proceedings
1. Evaluation of a new-generation photomask develop system for CAR
Cantrell, R. ; Tschinkl, M. ; Feicke, A. ; Porsche, W. ; Lee, G. ; Kotoda, T. ; Tichy, P. ; Fukai, T. ; Kamei, S. ; Asai, H.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.190-200,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. First photomask developer based on state-of-the-art wafer processing technology
Tichy, P. ; Fukai, T. ; Kamei, S. ; Asai, H. ; Kotoda, T. ; Takeshita, K. ; Miyamoto, T. ; Okamoto, Y. ; Funakoshi, H. ; Koga, S. ; Oono, S. ; Cantrell, R. ; Feicke, A. ; Porsche, W. ; Tschinkl, M. ; Lee, G.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1216-1227,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. Application of a wafer development process to mask making [5853-22]
Lee, G. ; Berger, C. ; Burgel, C. ; Feicke, A. ; Cantrell, R. ; Tschinkl, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.445-453,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853