1.

Conference Proceedings
Conference Proceedings
1. Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography
Lee, G. ; Hwang, Y.S. ; Ban, K.D. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.813-818,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. PEB sensitivity variation of 193-nm resist according to activation energy of protection groups
Oh, S.K. ; Kim, J.Y. ; Lee, J.W. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.625-632,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
Kim, J.-W. ; Son, E.-K. ; Lee, S.-H. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.599-607,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376