New shrinkage technology for nano-contact hole formation
- Author(s):
Oh, S. K. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J. Y. ( Dongjin Semichem Co., Ltd. (South Korea) ) Jung, Y. H. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, J. W. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, D. B. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, G. S. ( Hynix Semiconductor Inc. (South Korea) ) Lee, S. K. ( Hynix Semiconductor Inc. (South Korea) ) Ban, K. D. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J. C. ( Hynix Semiconductor Inc. (South Korea) ) Bok, C. K. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5753(1)
- Pub. Year:
- 2005
- Pt.:
- 1
- Page(from):
- 181
- Page(to):
- 186
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- Language:
- English
- Call no.:
- P63600/5753-1
- Type:
- Conference Proceedings
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