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23 results

Conference Proceedings

1. A new approach to preparation of standard LEDs for luminous intensity and flux measurement of LEDs (Invited Paper) [6355-17]

Park, S.-N. ; Park, S. ; Lee, D.-H.

Pub. info.:	Advanced LEDs for solid state lighting : 5-7 September 2006, Gwangju, South Korea. pp.63550G-, 2006. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6355

Conference Proceedings

2. Formation and Properties of Co-Suicide by Using Col-x Tax Alloy

Kim, M.-J. ; Lee, D.-H. ; Ko, D.-H. ; Ku, J.-H. ; Choi, S. ; Fujihara, K. ; Kang, H.-K. ; Oh, S-H. ; Park, C.-G. ; Lee, H.-J.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.571-580, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-2

Conference Proceedings

3. Nanocrystals Formation and Microstructure Evolution of Amorphous Si and Si0 7Ge0.3 by Using Low Pressure Chemical Vapor Deposition

Yoon, T.-S. ; Lee, D.-H. ; Koon, J.-K. ; Kim, K.B.

Pub. info.:	CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition. pp.419-426, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-13

Conference Proceedings

4. Implementation of a new LCD polarized stereoscopic projection system with improved light efficiency [5962-114]

Kim, S.-C. ; Lee, D.-H. ; Kim, E.-S.

Pub. info.:	Optical Design and Engineering II. pp.596238-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5962

Conference Proceedings

5. Insertion effects of various acid sensitive groups into acetal type polymer on the profile of 248-nm chemically amplified resist

Chung, Y.-S. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.-Y.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.660-670, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248-nm chemically amplified resist

Kim, H.-J. ; Chung, Y.-S. ; Lee, D.-H. ; Cho, S.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.Y.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.651-659, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. Evaluation of EA-PSM opaque repair on 90-nm lithography

Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.484-495, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Detection capability for chrome defect of tri-tone PSM

Lee, J.-K. ; Kim, D.-W. ; Shin, K.-M. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.439-445, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

9. Debris-free EUV source using a through-hole tin target

Ueno, Y. ; Aota, T. ; Niimi, G. ; Lee, D.-H. ; Nishigori, K. ; Yashiro, H. ; Tomie, T.

Pub. info.:	Emerging Lithographic Technologies VII. 2 pp.750-758, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

10.

Conference Proceedings

10. Preserving EAPSM phase and transmission in the clean process

Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.713-724, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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