1.

Conference Proceedings
Conference Proceedings
1. Evaluation of EA-PSM opaque repair on 90-nm lithography
Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.484-495,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Detection capability for chrome defect of tri-tone PSM
Lee, J.-K. ; Kim, D.-W. ; Shin, K.-M. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.439-445,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process
Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.597-605,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
4.

Conference Proceedings
Conference Proceedings
4. The judgment criteria of halftone pinhole defects
Shin, K.M. ; Kim, D.-W. ; Lee, J.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.330-341,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446