1.

Conference Proceedings
Conference Proceedings
1. Chemistry Modeling in Downstream Etch Systems from the Plasma Source to the Etch Chamber
Meeks, E. ; Larson, R.S. ; Shon, J.W. ; Vosen, S.R.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.608-630,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
2.

Conference Proceedings
Conference Proceedings
2. Deposition of Titanium Nitride Films in a Stagnation Flow Reactor and Comparison With Model Predictions
Allendorf, M.D. ; Arsenlis, A. ; Bastasz, R. ; Evans, G.H. ; Larson, R.S. ; Schulberg, M.T.
Pub. info.: Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.291-299,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-9
3.

Conference Proceedings
Conference Proceedings
3. A Reaction Mechanism for Titanium Nitride CVD from TiCl4 and NH3
Larson, R.S. ; Allendorf, M.D.
Pub. info.: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.41-46,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-5
4.

Technical Paper
Technical Paper
4. Modeling Chemistry in Lean NOx Traps under Reducing Conditions.
Larson, R.S. ; Chakravarthy, V.K. ; Pihl, J.A. ; Daw, C.S.
Pub. info.: 2006 Powertrain and Fluid Systems Conference and Exhibition : SAE technical paper.  2006.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2006