Bottom-ARC optimization methodology for O.25-ヲフm lithography and beyond
- Author(s):
Op,de,Beeck,M. ( IMEC (Belgium) ) Vandenberghe,G. ( IMEC (Belgium) ) Jaenen,P. ( IMEC (Belgium) ) Zhang,F.-H. ( IMEC (Belgium) ) Delvaux,C. ( IMEC (Belgium) ) Richardson,P. ( IMEC (Belgium) ) van,Puyenbroeck,I. ( IMEC (Belgium) ) Ronse,K. ( IMEC (Belgium) ) Lamb,III,J.E. ( Brewer Science,Inc. ) van,der,Hilst,J.B.C. ( ASM Japan ) van,Wingerden,J. ( Philips Research Labs. (Netherlands) ) - Publication title:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3334
- Pub. Year:
- 1998
- Page(from):
- 322
- Page(to):
- 336
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- Language:
- English
- Call no.:
- P63600/3334
- Type:
- Conference Proceedings
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