Challenges and solutions for transferring a 248-nm process to 365-nm imaging
- Author(s):
A. Serebriakov ( ASML Netherlands B.V. (Netherlands) ) C. Chang ( SMIC (China) ) A. Becht ( ASML Netherlands B.V. (Netherlands) ) R. Pluijms ( ASML Netherlands B.V. (Netherlands) ) A. Cheng ( ASML Netherlands B.V. (Netherlands) ) E. Shi ( ASML Netherlands B.V. (Netherlands) ) H. van den Broek ( ASML Netherlands B.V. (Netherlands) ) L. Zhao ( ASML Netherlands B.V. (Netherlands) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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