1.

Conference Proceedings
Conference Proceedings
1. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.78-85,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.303-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.392-399,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
4.

Conference Proceedings
Conference Proceedings
4. Comparative evaluation of mask cleaning performance
Jeong, W.-G. ; Park, D.- ; Park, E.-S. ; Cho, Y.-W. ; Choi, S.-J. ; Kwon, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.510-517,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing
Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.193-199,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
Jeong, W.-G. ; Park, D.-I. ; Park, E.-S. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.157-167,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. A study of post-exposure baking effect for CAR process in photomask fabrication
Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.190-196,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130