Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.614-621, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
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EUV, X-ray, and gamma-ray instrumentation for astronomy VIII : 30 July - 1 August 1997, San Diego, California, Oswald H. W. Siegmund, Mark A. Gummin, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering. pp.414-421, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering