1.

Conference Proceedings
Conference Proceedings
1. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.I. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
2.

Conference Proceedings
Conference Proceedings
2. A Three-Dimensional Computational Fluid Dynamics Model of a Horizontal Rotating Disk CVD Reactor
Kommu, S. ; Wilson, G.M.
Pub. info.: Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11.  pp.222-229,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-25
3.

Conference Proceedings
Conference Proceedings
3. SILICON EPITAXY AND PARTICLE DYNAMICS: A THEORETICAL AND EXPERIMENTAL STUDY
Kommu, S.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.311-324,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
4.

Conference Proceedings
Conference Proceedings
4. Computer Simulation Of Injected Pultrusion Processes
Kommu, S. ; Kardos, J. ; Khomami, B.
Pub. info.: AIChE ANNUAL MEETING - NOVEMBER 10-15, 1996 - CHICAGO, IL.  1996.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1996
5.

Conference Proceedings
Conference Proceedings
5. SILICON EPITAXY AND PARTICLE DYNAMICS: A THEORETICAL AND EXPERIMENTAL STUDY
Kommu, S.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.311-322,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
6.

Conference Proceedings
Conference Proceedings
6. THE CONTROL OF BORON AUTO-DOPING DURING DEVICE PROCESSING FOR P/P+ EPI WAFERS WITH NO BACK-SURFACE OXIDE SEAL
Binns, M.J. ; Kommu, S. ; Seacrist, M.R. ; Standley, R.W. ; Wise, R. ; Myers, D.J. ; Tisserand, D. ; Doyle, D.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.682-693,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2