1.

Conference Proceedings
Conference Proceedings
1. Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography
Kim,S.-K. ; Kim,Y.-S. ; Kim,J.-S. ; Bok,C.-K. ; Ham,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.435-442,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography
Ham,Y.-M. ; Kim,S.-K. ; Kim,S.-J. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H. ; Kim,B.-H. ; Ahn,D.-J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1053-1061,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF
Kim,S.-K. ; Ahn,C.-N. ; Kim,S.-M. ; Ham,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.691-696,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679