1.

Conference Proceedings
Conference Proceedings
1. Challenge to 0.13-ｦﾌm device patterning using KrF
Kim,I.-S. ; Lee,J.-H. ; Cha,D.-H. ; Park,J.-S. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.872-881,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Feasibility of very low k1(=0.31) KrF lithography
Kim,I.-S. ; Kim,B.-S. ; Lee,J.-H. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.17-24,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
3.

Conference Proceedings
Conference Proceedings
3. One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application
Kang,H.-J. ; Kim,B.-S. ; Park,J.-S. ; Kim,I.-S. ; Yeo,G.-S. ; Lee,J.-H. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.1096-1103,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562