1.

Conference Proceedings
Conference Proceedings
1. Preserving EAPSM phase and transmission in the clean process
Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.713-724,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)
Yoon, S.-Y. ; Choi, S.-J. ; Kim, Y.-D. ; Lee, D.-H. ; Cha, H.-S. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.332-340,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.303-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
4.

Conference Proceedings
Conference Proceedings
4. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.392-399,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing
Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.193-199,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. A study for the control of chemical residuals on photomasks by using a thermal treatment for 65-nm node [5853-30]
Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.501-506,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. Accurate alignment technique for nanoimprint lithography
Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.429-437,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752