1.

Conference Proceedings
Conference Proceedings
1. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing
Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.193-199,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. A study for the control of chemical residuals on photomasks by using a thermal treatment for 65-nm node [5853-30]
Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.501-506,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Accurate alignment technique for nanoimprint lithography
Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.429-437,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752