1.

Conference Proceedings
Conference Proceedings
1. Toward efficient unidirectional photonic crystal light emitters (Best Student Paper Award) [6352-42]
Kim, S.-H. ; Kim, S.-K. ; Lee, Y.-H.
Pub. info.: Optoelectronic materials and devices : 5-7 September, 2006, Gwangju, South Korea.  pp.635213-635213,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6352
2.

Conference Proceedings
Conference Proceedings
2. Microphotonics: physics, technology, and an outlook toward the 21st Century (Invited Paper)
Lee, E.-H. ; Lee, S.-G. ; O, B.-H. ; Kim, S.-K.
Pub. info.: APOC 2001: Asia-Pacific Optical and Wireless Communications : Optoelectronics, Materials, and Dvices for Communications : 13-15 November 2001, Beijing, Chaina.  pp.263-272,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4580
3.

Conference Proceedings
Conference Proceedings
3. Highly Reflective and Low Resistance Indium Oxide/Ag Ohmic Contacts to p-GaN for Flip-Chip Light Emitting Diodes
Song, J.-O. ; Kim, S.-K. ; Leem, D.-S. ; Kwak, J.S. ; Park, Y. ; Seen, T.-Y.
Pub. info.: State-of-the-art program on compound semiconductors XLI and nitride and wide bandgap semiconductors for sensors, photonics, and electronics V : proceedings of the international symposia.  pp.236-244,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-06
4.

Conference Proceedings
Conference Proceedings
4. Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist
Kim, S.-K. ; An, I. ; Oh, H.-K. ; Lee, S. M. ; Bok, C. K. ; Moon, S. C.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.592-602,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. Nanomolecular resists with adamantane core for 193-nm lithography
Kim, S.-K. ; An, I. ; Oh, H.-K. ; Lee, S. M. ; Bok, C. K. ; Moon, S. C.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.603-610,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
6.

Conference Proceedings
Conference Proceedings
6. User-preferred color temperature conversion for video on TV or PC
Park, D.-S. ; Kim, S.-K. ; Kim, C.-Y. ; Choi, W.-H. ; Lee, S.-D. ; Seo, Y.-S.
Pub. info.: Color imaging VIII : processing, hardcopy, and applications : 21-24 January 2003, Santa Clara, California, USA.  pp.285-293,  2003.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5008
7.

Conference Proceedings
Conference Proceedings
7. Probabilistic microcell prodiction model
Kim, S.-K.
Pub. info.: Digital wireless communications IV : 1-2 April 2002, Orlando, USA.  pp.34-41,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4740
8.

Conference Proceedings
Conference Proceedings
8. Micro/nano-scale integrated photonic devices and circuits: issues and challenges (Invited Paper)
Lee, E.-H. ; Lee, S.-G. ; O, B.H. ; Park, S.-G. ; Kim, S.-K.
Pub. info.: Materials and devices for optical and wireless communications : APOC 2002 : Asia-Pacific Optical and Wireless Communications : 15-18 October, 2002, Shanghai, China.  pp.170-182,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4905
9.

Conference Proceedings
Conference Proceedings
9. Simulation benchmarking for the whole resist process
Kim, S.-K. ; Lee, J.-E. ; Park, S.-W. ; Yoo, J.-Y. ; Oh, H.-
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.58-64,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
10.

Conference Proceedings
Conference Proceedings
10. Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing [5853-19]
Kim, S.-K. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.425-431,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853