1.

Conference Proceedings
Conference Proceedings
1. Multi-point CD measurement method to evaluate pattern fidelity and performance of mask [6349-155]
Kim, M. ; Lee, H. ; Seo, K. ; Lee, D. ; Choi, Y. ; Oh, S. ; Han, O.
Pub. info.: Photomask Technology 2006.  pp.634944-634945,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. The CD measuring repeatability enhancement by intensity gradient [6283-49]
Choi, Y. ; Kim, S. ; Kim, M. ; Han, O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. CD measurement evaluation on periodic patterns between optic tools and CD-SEM [6349-60]
Choi, Y. ; Kim, M. ; Oh, S. ; Han, O.
Pub. info.: Photomask Technology 2006.  pp.63491N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349