1.

Conference Proceedings
Conference Proceedings
1. Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
Hwang, Y.-S. ; Jung, J.-C. ; Park, K.-D. ; Lee, S.-K. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S. ; Ding, S.-J. ; Xiang, Z. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1119-1125,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Contact hole patterning performance of ArF resist for 0.10μm technology node
Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Lee, G.-S. ; Lee, S.-K. ; Hwang, Y.-S. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.577-585,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. 100-nm device fabrication using ArF resist
Lee, S.-K. ; Jung, J.-C. ; Hwang, Y.-S. ; Park, K.-D. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.571-576,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
You, T.-J. ; Kim, H.S. ; Kim, J.-S. ; Kim, S.-K. ; Kim, Y.-D. ; Youn, H.S. ; Kong, K.-K.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1327-1334,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Printing 95-nm DRAM full chip patterns in KrF lithography
Kim, S.-K. ; Kim, J.-S. ; Yoo, T.-J. ; Kong, K.-K. ; Yun, H.-S. ; Kim, Y.-D. ; Kim, H.-R. ; Kim, Y.-S. ; Kim, H.S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1321-1326,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography
Kim, Y.-S. ; You, T.J. ; Kim, J.-S. ; Kim, S.-K. ; Kong, K.-K. ; Kim, Y.-D. ; Kim, H.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1107-1113,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
7.

Conference Proceedings
Conference Proceedings
7. Effects of alkali treatment on ArF resist process
Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Kim, H.-R. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.761-769,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039