1.

Conference Proceedings
Conference Proceedings
1. Bonding technologies ofr silicon scanning mirror having vertical comb fingers
Lee, J.-H. ; Ko, Y.-C. ; Choi, B.-S. ; Kim, J.-M. ; Jeon, D.-Y.
Pub. info.: Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia.  pp.428-435,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4592
2.

Conference Proceedings
Conference Proceedings
2. PHOTOINDUCED CHARGE TRANSFER STUDIES IN BOLAAMPHIPHILEGRAMICIDIN-PORPHYRIN MEMBRANES
Thompson, David H. ; Kim, J.-M.
Pub. info.: Macromolecular host-guest complexes : optical, optoelectronic, and photorefractive properties and applications : symposium held April 27-28, 1992, San Francisco, California, U.S.A..  pp.93-98,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 277
3.

Conference Proceedings
Conference Proceedings
3. Effect of Viscosity of Liquid Resin on Resin Self-Alignment Capability
Kim, J.-M. ; Shin, Y.-E. ; Fujimoto, K.
Pub. info.: Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003.  pp.12-17,  2003.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 439
4.

Conference Proceedings
Conference Proceedings
4. Lithographic importance of acid diffusion in chemically amplified resists
Noh, C.-H. ; Kim, J.-Y. ; Lee, H.-C. ; Hwang, O.-C. ; Cho, S.-H. ; Song, K.-Y. ; Kim, J.-M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.269-280,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. Production and Properties of Glass-Ceramic from Incinerator Fly Ash
Kim, H.-S. ; Kim, J.-M. ; Oshikawa, T. ; Ikeda, K.
Pub. info.: Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003.  pp.180-185,  2003.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 439
6.

Conference Proceedings
Conference Proceedings
6. Fabrication of micromachined ceramic thin-film-type pressure sensors for overpressure tolerance and its characteristics
Chung, G.-S. ; Kim, J.-M.
Pub. info.: Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia.  pp.11-18,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5276
7.

Conference Proceedings
Conference Proceedings
7. Measurement Method of Carbon Char Content from Industry Sludge
Kim, H.-S. ; Kim, J.-M.
Pub. info.: Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003.  pp.137-142,  2003.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 439
8.

Conference Proceedings
Conference Proceedings
8. Laser TV for home theater
Lee, J.-H. ; Mun, Y.-K. ; Do, S.-W. ; Ko, Y.-C. ; Kong, D.-H. ; Choi, B.-S. ; Kim, J.-M. ; Hong, C.-W. ; Jeon, D.-Y.
Pub. info.: Projection Displays VIII.  pp.138-146,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4657
9.

Conference Proceedings
Conference Proceedings
9. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node [5853-07]
Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.58-65,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
10.

Conference Proceedings
Conference Proceedings
10. A study of storage life extension for high performance chemically amplified resist coated blanks [5853-03]
Yang, S.-J. ; Seo, S.-M. ; Ko, S.-H. ; Cha, H.-S. ; Kang, G.-W. ; Nam, K.-S. ; Seo. W.-W. ; Jung, W.-K. ; Cho, H.-K. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.20-30,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
11.

Conference Proceedings
Conference Proceedings
11. Evaluation of EA-PSM opaque repair on 90-nm lithography
Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.484-495,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
12.

Conference Proceedings
Conference Proceedings
12. Detection capability for chrome defect of tri-tone PSM
Lee, J.-K. ; Kim, D.-W. ; Shin, K.-M. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.439-445,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
13.

Conference Proceedings
Conference Proceedings
13. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.78-85,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
14.

Conference Proceedings
Conference Proceedings
14. Preserving EAPSM phase and transmission in the clean process
Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.713-724,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
15.

Conference Proceedings
Conference Proceedings
15. Comparative evaluation of mask production CAR development processes with stepwise defect inspection
Jeong, W.-G. ; Lee, J.-K. ; Park, D.I. ; Park, E.-S. ; Lee, J.-H. ; Seo, S.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.S. ; Jeong, S.H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.626-633,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
16.

Conference Proceedings
Conference Proceedings
16. 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
Park, D.-I. ; Seo, S.-K. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.-H.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.634-640,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
17.

Conference Proceedings
Conference Proceedings
17. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)
Yoon, S.-Y. ; Choi, S.-J. ; Kim, Y.-D. ; Lee, D.-H. ; Cha, H.-S. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.332-340,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
18.

Conference Proceedings
Conference Proceedings
18. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures
Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.303-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
19.

Conference Proceedings
Conference Proceedings
19. Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process
Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.597-605,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
20.

Conference Proceedings
Conference Proceedings
20. Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing
Kim, Y.-D. ; Lee, D.-S. ; Park, D.-I. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.392-399,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
21.

Conference Proceedings
Conference Proceedings
21. Proposal of all-optical logic gate based on MMI
Kim, J.-M. ; Seo, Y.-G. ; Yoon, H.-D. ; Im, Y.-M.
Pub. info.: Optical Fibers and Passive Components.  pp.497-500,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5279
22.

Conference Proceedings
Conference Proceedings
22. Comparative evaluation of mask cleaning performance
Jeong, W.-G. ; Park, D.- ; Park, E.-S. ; Cho, Y.-W. ; Choi, S.-J. ; Kwon, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.510-517,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
23.

Conference Proceedings
Conference Proceedings
23. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing
Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.193-199,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
24.

Conference Proceedings
Conference Proceedings
24. The judgment criteria of halftone pinhole defects
Shin, K.M. ; Kim, D.-W. ; Lee, J.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.330-341,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
25.

Conference Proceedings
Conference Proceedings
25. A study for the control of chemical residuals on photomasks by using a thermal treatment for 65-nm node [5853-30]
Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.501-506,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
26.

Conference Proceedings
Conference Proceedings
26. A new DBA algorithm supporting priority queues and fairness for EPON
Jang, S.-H. ; Kim, J.-M. ; Jang, J.-W.
Pub. info.: Network Architectures, Management, and Applications II.  pp.1116-1122,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5626
27.

Conference Proceedings
Conference Proceedings
27. Accurate alignment technique for nanoimprint lithography
Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.429-437,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
28.

Conference Proceedings
Conference Proceedings
28. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
Jeong, W.-G. ; Park, D.-I. ; Park, E.-S. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.157-167,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
29.

Conference Proceedings
Conference Proceedings
29. The feasibility study of thin Cr film for low process bias
Seo, W.-W. ; Yoon, S.-Y. ; Park, D.-I. ; Park, E.-S. ; Kim, J.-M. ; Jeong, S.-M. ; Choi, S.-S. ; Cha, H.-S. ; Nam, K.S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.136-143,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
30.

Conference Proceedings
Conference Proceedings
30. A study of post-exposure baking effect for CAR process in photomask fabrication
Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.190-196,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130