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19 results

Conference Proceedings

1. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node [5853-07]

Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.58-65, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

2. A study of storage life extension for high performance chemically amplified resist coated blanks [5853-03]

Yang, S.-J. ; Seo, S.-M. ; Ko, S.-H. ; Cha, H.-S. ; Kang, G.-W. ; Nam, K.-S. ; Seo. W.-W. ; Jung, W.-K. ; Cho, H.-K. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.20-30, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Evaluation of EA-PSM opaque repair on 90-nm lithography

Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.484-495, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. Detection capability for chrome defect of tri-tone PSM

Lee, J.-K. ; Kim, D.-W. ; Shin, K.-M. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.439-445, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Park, D.-I. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.78-85, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Preserving EAPSM phase and transmission in the clean process

Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.713-724, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

7. 90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process

Park, D.-I. ; Seo, S.-K. ; Park, E.-S. ; Lee, J.-H. ; Jeong, W.-G. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.-H.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.634-640, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

8. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)

Yoon, S.-Y. ; Choi, S.-J. ; Kim, Y.-D. ; Lee, D.-H. ; Cha, H.-S. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.332-340, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

9. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.303-311, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

10.

Conference Proceedings

10. Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process

Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.597-605, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

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