Improvement of CD controllability in developer process
- Author(s):
Kyoda, H. ( Tokyo Electron Kyushu Ltd. (Japan) ) Okouchi, A. ( Tokyo Electron Kyushu Ltd. (Japan) ) Takeguchi, H. ( Tokyo Electron Kyushu Ltd. (Japan) ) Kim, H.W. ( Tokyo Electron Kyushu Ltd. (Japan) ) Yamamoto, T. ( Tokyo Electron Kyushu Ltd. (Japan) ) Yoshihara, K. ( Tokyo Electron Kyushu Ltd. (Japan) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 1353
- Page(to):
- 1365
- Pages:
- 13
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Characterization of resist flow process for the improvement of contact hole CD uniformity
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
4
Conference Proceedings
Wafer management between coat/developer track and immersion lithography tool [6154-177]
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Highly accurate CD control at stitching region for electron-beam projection lithography
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
First photomask developer based on state-of-the-art wafer processing technology
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Sidewall structure estimation from CD-SEM for lithographic process control
SPIE-The International Society for Optical Engineering |