1.

Conference Proceedings
Conference Proceedings
1. Investigation on micro-trench formation of alternating aperture phase shift masks
Kwon, S.-W. ; Jeong, H.-S. ; Kim, L.-J. ; Ahn, C.-N. ; Kim, H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.796-803,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Negative chemically amplified resist in making mask for a logic device with high pattern density
Nam, K.-H. ; Cho, H.-J. ; Jeong, S.-H. ; Ahn, C.-N. ; Kim, H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.197-204,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130