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Application of newly synthesized poly(hydroxystyrene-acrylate) copolymers to improve vacuum stability on E-beam resist for mask fabrication

Author(s):
Lee, D.- ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, S.- ( Dongjin Semichem Co., Ltd. (South Korea) )
Choi, D.- ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, C.- ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
565
Page(to):
574
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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